Published November 1996
| Version v1
Journal article
Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions
Creators
- 1. EMAT, University of Antwerp (RUCA), Groenenborgerlaan 171, B-2020 Antwerp (Belgium)
- 2. Department of Applied Physics, University of Twente, PO Box 217, 7500 AE Enschede (Netherlands)
Description
The dependence of the ramp geometry on high- or low-angle ion-beam etching, used to structure ramp-type Josephson junctions based on ReBa2Cu3O7-δ high-Tc superconductors, is investigated by cross-section transmission electron microscopy. The surface quality, interfaces and crystal defects are analysed by high-resolution electron microscopy. Technical difficulties to reproducibly obtain the desired slope angle and shape make high-angle ion-beam etching less interesting although the surface quality is comparable and no systematic differences in electrical properties are observed. (author)
Availability note (English)
Available online at the Web site for the journal Superconductor Science and Technology (ISSN 1361-6668) http://www.iop/org/Additional details
Identifiers
- URL
- http://www.iop/org/;
Publishing Information
- Journal Title
- Superconductor Science and Technology
- Journal Volume
- 9
- Journal Issue
- 11
- Journal Page Range
- p. 978-984
- ISSN
- 0953-2048
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- Romania
- INIS RN
- 31059317
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ARGON IONS; BARIUM; COPPER; CRYSTAL DEFECTS; ELECTRICAL PROPERTIES; ETCHING; INTERFACES; ION BEAMS; JOSEPHSON JUNCTIONS; OXYGEN; RHENIUM; SURFACES; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ALKALINE EARTH METALS; ALLOYS; BEAMS; CHARGED PARTICLES; CRYSTAL STRUCTURE; ELECTRON MICROSCOPY; ELEMENTS; IONS; METALS; MICROSCOPY; NONMETALS; PHYSICAL PROPERTIES; REFRACTORY METALS; SEMICONDUCTOR JUNCTIONS; SUPERCONDUCTING JUNCTIONS; SURFACE FINISHING; TRANSITION ELEMENTS