Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses

We report extensive measurements of damage thresholds for fused silica and calcium fluoride at 1053 and 526 nm for pulse durations τ ranging from 270 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated τ1/2 scaling indicate that damage results from plasma formation and ablation for τ≤10 ps and from conventional melting and boiling for τ>100 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with experimental results