Nanostructure fabrication of InP by low energy ion beams

Spatially ordered dot structures with a size ranged between 30 and 60 nm and a height over 100 nm have been found on InP surfaces irradiated by 0.5-2 keV Ar ions. Their dependences on ion energy, dose, incident angle and sample temperature have been investigated from AFM and SEM observations. With an increase of dose, dot size increases, whereas its density decreases and finally saturate at 60 nm and 2.8 x 1010/cm2. Spatial ordering and size uniformity of dots seem to be superior after irradiation at 0.5 and 1 keV and degrade at higher energy. This is applicable as a simple fabrication technique for nanostructure with high density and uniformity compatible with crystal growth