Published April 11, 1979 | Version v1
Report Restricted

Characteristics of thick non-planar SiO2 coatings

Creators

Description

We have successfully developed a new process for making strong, smooth, thick SiO2 films on hemispherical Kovar mandrels of various sizes designed for multishell Laser Fusion Targets. The surface finish obtainable with a 13 μm thick SiO3 coating on a 260 μm dia. mandrel is approximately 30 nm peak-to-peak, with a few defects of roughly 0.3 μm deep. The rf magnetron sputtered SiO2 films were dense and crystalline

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01.

Files

Restricted

The record is publicly accessible, but files are restricted to users with access.

Additional details

Publishing Information

Imprint Pagination
14 p.
Report number
UCRL--81842

Conference

Title
International conference on metallurgical coatings.
Dates
23 - 27 Apr 1979.
Place
San Diego, CA, USA.

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
10493663
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COATINGS; FABRICATION; LASERS; MAGNETRONS; SILICON OXIDES; SPUTTERING; TARGETS
Descriptors DEC
AMPLIFIERS; CHALCOGENIDES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS

Optional Information

Secondary number(s)
CONF-790442--15.