Published 1974
| Version v1
Report
Restricted
Gold doping of silicon by means of ion implantation
- 1. Allgemeine Elektricitaets-Gesellschaft AEG Telefunken, Ulm (F.R. Germany)
- 2. Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung e.V., Freiburg im Breisgau (F.R. Germany). Inst. fuer Angewandte Festkoerperphysik
Description
no abstract available
Availability note (English)
MF available from INIS under the Report Number.
Files
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Additional details
Additional titles
- Original title (German)
- Gold-Dotierung von Silicium mittels Ionenimplantation
Publishing Information
- Imprint Pagination
- 11 p.
- Report number
- AED-Conf--74-089-010
Conference
- Title
- Spring meeting of the Arbeitskreis Festkoerperphysik of the Deutsche Physikalische Gesellschaft e.V.
- Dates
- 1 Apr 1974.
- Place
- Freudenstadt, F.R. Germany.
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 5149436
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; COMPUTER CALCULATIONS; CRYSTAL DOPING; DIFFUSION; DISTRIBUTION; DOPED MATERIALS; GOLD; ION IMPLANTATION; SILICON; SOLUBILITY; VACANCIES
- Descriptors DEC
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; HEAT TREATMENTS; METALS; POINT DEFECTS; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Notes
- 8 figs.