Published October 2010
| Version v1
Journal article
Nanocrystalline WO3 film with high photo-electrochemical activity prepared by polymer-assisted direct deposition
Creators
- 1. Eco-friendly Catalysis and Energy Laboratory, Department of Chemical Engineering Pohang University of Science and Technology (POSTECH), San 31, Hyojadong, Namgu, Pohang 790-784 (Korea, Republic of)
Description
Highly photoactive, nanocrystalline WO3 films were fabricated by an economic solution process based on polymer-assisted direct deposition. The optimized film exhibited a photocurrent of 2.3 mA cm-2 (at 1.23 V vs. reversible hydrogen electrode) under simulated solar illumination (air mass 1.5 global) and a maximum incident photon to current efficiency of 71% at an incident wavelength of 340 nm. The observed performance represents one of the highest values reported for WO3. High crystallinity, porosity and optimum thickness of nanocrystalline films were identified as the critical variables that induce the high photoactivity.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scriptamat.2010.05.021Additional details
Identifiers
- DOI
- 10.1016/j.scriptamat.2010.05.021;
- PII
- S1359-6462(10)00346-5;
Publishing Information
- Journal Title
- Scripta Materialia
- Journal Volume
- 63
- Journal Issue
- 7
- Journal Page Range
- p. 757-760
- ISSN
- 1359-6462
- CODEN
- SCMAF7
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45024404
- Subject category
- S36: MATERIALS SCIENCE; S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- CRYSTALS; DEPOSITION; ELECTROCHEMICAL CELLS; ELECTROCHEMISTRY; HYDROGEN; NANOSTRUCTURES; PHOTOCURRENTS; POLYMERS; POROSITY; QUANTUM EFFICIENCY; THIN FILMS; TUNGSTEN OXIDES; WAVELENGTHS
- Descriptors DEC
- CHALCOGENIDES; CHEMISTRY; CURRENTS; EFFICIENCY; ELECTRIC CURRENTS; ELEMENTS; FILMS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.