Published December 2013
| Version v1
Book
Bulk characterization of 14N implanted target using resonance reaction and SIMS measurements
Creators
- 1. Saha Institute of Nuclear Physics, Kolkata (India)
- 2. Tata Institute of Fundamental Research, Mumbai (India)
Description
Implantation technique has been found to be one of the most effective methods to produce targets which are isotopically pure and can withstand high beam load over a long time. To use these targets in Nuclear Physics or Nuclear Astrophysics experiments, the distribution profile of implanted ions in the backing should be known precisely. This profile depends on the type of implanted ion, the backing material, the implantation energy and the implantation dose
Additional details
Publishing Information
- Publisher
- Bhabha Atomic Research Centre
- Imprint Place
- Mumbai (India)
- Imprint Title
- DAE-BRNS symposium on nuclear physics. V. 58
- Imprint Pagination
- 1041 p.
- Journal Page Range
- p. 996-997
Conference
- Title
- 58. DAE-BRNS symposium on nuclear physics
- Dates
- 2-6 Dec 2013
- Place
- Mumbai (India)
INIS
- Country of Publication
- India
- Country of Input or Organization
- India
- INIS RN
- 45043272
- Subject category
- S73: NUCLEAR PHYSICS AND RADIATION PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CROSS SECTIONS; KEV RANGE 100-1000; NITROGEN 14 REACTIONS; OXYGEN 15; PHOTONUCLEAR REACTIONS; PROTON BEAMS
- Descriptors DEC
- BEAMS; BETA DECAY RADIOISOTOPES; BETA-PLUS DECAY RADIOISOTOPES; ENERGY RANGE; EVEN-ODD NUCLEI; HEAVY ION REACTIONS; ISOTOPES; KEV RANGE; LIGHT NUCLEI; MINUTES LIVING RADIOISOTOPES; NUCLEAR REACTIONS; NUCLEI; NUCLEON BEAMS; OXYGEN ISOTOPES; PARTICLE BEAMS; RADIOISOTOPES
Optional Information
- Notes
- 6 refs., 3 figs.