Published November 17, 1981 | Version v1
Patent Metadata-only

Negative resist for high energy radiation

Creators

Description

Negative resist materials comprising soluble, film-forming polymers with side branches containing vinyl silyl groups are used for pattern generation on exposure to high energy radiation such as electron beams or x-rays

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
v p.
IPC:
Int. Cl.G03C 1/68.
IPC
Int. Cl.G03C 1/68.
Patent number
US patent document 4,301,231/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
13696419
Subject category
S42: ENGINEERING;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ELECTRON BEAMS; FABRICATION; FILMS; IMAGES; POLYMERS; PRINTED CIRCUITS; PRODUCTION; RESISTAL; SILICON; VINYL RADICALS; X RADIATION
Descriptors DEC
ALKYL RADICALS; ALLOYS; ALUMINIUM ALLOYS; BEAMS; COPPER ALLOYS; COPPER BASE ALLOYS; ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; ELEMENTS; IONIZING RADIATIONS; IRON ALLOYS; LEPTON BEAMS; PARTICLE BEAMS; RADIATIONS; RADICALS; SEMIMETALS; TRANSITION ELEMENT ALLOYS

Optional Information

Notes
PAT-APPL-121914.