Published March 15, 2007 | Version v1
Journal article

Simplified description of microwave plasma discharge for chemical vapor deposition of diamond

  • 1. Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Japan, Midorigaoka 1-8-31, Ikeda, Osaka 563-8577 (Japan)

Description

A fluid model to prescribe microwave plasma is proposed. The conservation equations for electron are reduced to only one differential equation. Therefore, the computational cost is also reduced as small as possible. One may extend functions of existing program for vacuum field analysis to microwave plasma simulator by coupling this differential equation with Maxwell equations. While the model is quite simple, this model can prescribe distributions of electron temperature as well as the number density, whereas effects of inelastic collisions with ions and neutrals are taken into account. Test calculation is carried out in three dimensional system and well reproduces experimental observation and prediction obtained by other model

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
101
Journal Issue
6
Journal Page Range
p. 063302-063302.6
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2007 American Institute of Physics