Analytical modeling and simulation of germanium single gate silicon on insulator TFET

This paper proposes a new two dimensional (2D) analytical model for a germanium (Ge) single gate silicon-on-insulator tunnel field effect transistor (SG SOI TFET). The parabolic approximation technique is used to solve the 2D Poisson equation with suitable boundary conditions and analytical expressions are derived for the surface potential, the electric field along the channel and the vertical electric field. The device output tunnelling current is derived further by using the electric fields. The results show that Ge based TFETs have significant improvements in on-current characteristics. The effectiveness of the proposed model has been verified by comparing the analytical model results with the technology computer aided design (TCAD) simulation results and also comparing them with results from a silicon based TFET. (semiconductor devices)