Air-based sputtering deposition of TiNxOy films for solar selective absorber coatings applications
Creators
- 1. Department of Materials Science Engineering, National Chung Hsing University, 145 Xingda Road, Taichung 402, Taiwan (China)
Description
Highlights: •TiNxOy thin films with tunable properties were produced by air-based sputtering. •The structures and properties of TiNxOy films changed gradually by varying air/Ar. •The trace components in air barely influenced TiNxOy films during sputtering. •Gradient TiNxOy-based coatings show promising performance for SSA applications. -- Abstract: Titanium oxynitride (TiNxOy) thin films with tunable electrical and optical properties were produced by sputtering using air as a reactive gas at a high base pressure of 1.3 × 10−2 Pa. Pure N2 and O2 with a fixed ratio of 79/21 was also used as a reference reactive gas (denoted as S-air) at a low base pressure of 6.7 × 10−4 Pa to investigate the influence of trace components in air on the characteristics of the films. By merely changing either the air/Ar or the S-air/Ar flow ratio within suitable processing windows, crystal phases, microstructures, electrical resistivities, and optical properties could be tailored. In practice, the TiNxOy thin films produced by such air-based sputtering could turn from conductive, semiconductive, to dielectric and would correspondingly change from opaque, translucent, to transparent. For solar selective absorber (SSA) coatings evaluations, bilayer and gradient TiNxOy-based SSA structures were tested, respectively. The gradient TiNxOy SSA coatings exhibited the best performance with solar absorptance of 86.3% and thermal emittance of 11.3%. This facile air-based sputtering technique with such a gradient coating design has great potential for solar selective absorber coatings applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2018.03.085Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2018.03.085;
- PII
- S0040609018302359;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 660
- Journal Page Range
- p. 733-740
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50036996
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COATINGS; CRYSTALS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; LAYERS; MICROSTRUCTURE; OPTICAL PROPERTIES; OXYNITRATES; SPUTTERING; THIN FILMS; TITANIUM COMPOUNDS
- Descriptors DEC
- ELECTRICAL PROPERTIES; FILMS; MATERIALS; NITROGEN COMPOUNDS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.