Published August 2018 | Version v1
Journal article

Air-based sputtering deposition of TiNxOy films for solar selective absorber coatings applications

  • 1. Department of Materials Science Engineering, National Chung Hsing University, 145 Xingda Road, Taichung 402, Taiwan (China)

Description

Highlights: •TiNxOy thin films with tunable properties were produced by air-based sputtering. •The structures and properties of TiNxOy films changed gradually by varying air/Ar. •The trace components in air barely influenced TiNxOy films during sputtering. •Gradient TiNxOy-based coatings show promising performance for SSA applications. -- Abstract: Titanium oxynitride (TiNxOy) thin films with tunable electrical and optical properties were produced by sputtering using air as a reactive gas at a high base pressure of 1.3 × 10−2 Pa. Pure N2 and O2 with a fixed ratio of 79/21 was also used as a reference reactive gas (denoted as S-air) at a low base pressure of 6.7 × 10−4 Pa to investigate the influence of trace components in air on the characteristics of the films. By merely changing either the air/Ar or the S-air/Ar flow ratio within suitable processing windows, crystal phases, microstructures, electrical resistivities, and optical properties could be tailored. In practice, the TiNxOy thin films produced by such air-based sputtering could turn from conductive, semiconductive, to dielectric and would correspondingly change from opaque, translucent, to transparent. For solar selective absorber (SSA) coatings evaluations, bilayer and gradient TiNxOy-based SSA structures were tested, respectively. The gradient TiNxOy SSA coatings exhibited the best performance with solar absorptance of 86.3% and thermal emittance of 11.3%. This facile air-based sputtering technique with such a gradient coating design has great potential for solar selective absorber coatings applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2018.03.085

Additional details

Identifiers

DOI
10.1016/j.tsf.2018.03.085;
PII
S0040609018302359;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
660
Journal Page Range
p. 733-740
ISSN
0040-6090
CODEN
THSFAP

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50036996
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
COATINGS; CRYSTALS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; LAYERS; MICROSTRUCTURE; OPTICAL PROPERTIES; OXYNITRATES; SPUTTERING; THIN FILMS; TITANIUM COMPOUNDS
Descriptors DEC
ELECTRICAL PROPERTIES; FILMS; MATERIALS; NITROGEN COMPOUNDS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; TRANSITION ELEMENT COMPOUNDS

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.