Development and optimization of In2O3-based thin layers for the detection of NO2 and O3

For the fabrication of the thin layers the method of the reactive HF-magnetron sputtering with a pressed In2O3 target was applied. In this thesis this approach was taken and by means of Ar/O2 but also with Ar/N2 process gases as sputtering atmosphere for the first time the microstructure and the against NO2 gas-sensitive properties correlated with this systematically varied and optimized. thereby also the influence of the sputtering power and the temperature of the subsequent tempering on the layer properties is studies and both parameters for the optimization applied. The thin layers are physically studied by XRD, SEM, TEM, and WDX respectively AES. The results are discussed in the framework of an existing model for the interaction of NO2 and O2 with In2O3, as well as the model extended by the geometric factor of the lattice constant of In2O3 respectively the distance of the catalytic centers In2+ and V0*