Published 2000 | Version v1
Miscellaneous

Properties of Si:H and Si:He heated under high pressure and 'smart-cut' technology

  • 1. Instytut Technologii Elektronowej, Warsaw (Poland)
  • 2. Instytut Technologii Materialow Elektronicznych, Warsaw (Poland)
  • 3. Instytut Fizyki, Polska Akademia Nauk, Warsaw (Poland)
  • 4. University of Barcelona, Barcelona (Spain)
  • 5. CNR-IMETEM Institute Stradale Primosole, Catania (Italy)

Description

no abstract available

Part of:
Abstracts book of 7. Scientific Conference 'Electronic Technology' ELTE 2000

Additional details

Additional titles

Original title (Polish)
Wlasnosci Si:H i Si:He wygrzewanych pod wysokim cisnieniem, a technologia 'smart-cut'

Publishing Information

Imprint Title
Abstracts book of 7. Scientific Conference 'Electronic Technology' ELTE 2000
Imprint Pagination
[RP 1-9; RS 1; ME 1-78; MN 1-58; F 1-73; TP 1-48; MG 1-16; MS 1-51]
Journal Page Range
p. ME, 21

Conference

Title
7. Scientific Conference 'Electronic Technology' ELTE 2000
Original Conference Title
7. Konferencja Naukowa 'Technologia Elektronowa' ELTE 2000
Dates
18-22 Sep 2000
Place
Polanica-Zdroj (Poland)

Optional Information

Contract/Grant/Project number
KBN grant no. 7T08A057
Notes
2 refs Imprint:Zbior streszczen 7. Konferencja Naukowa 'Technologia Elektronowa' ELTE 2000