Published February 1998 | Version v1
Journal article

Production of highly charged ion beams from electron cyclotron resonance ion sources (invited)

Creators

  • 1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

Description

Electron cyclotron resonance ion source (ECRIS) development has progressed with multiple-frequency plasma heating, higher mirror magnetic fields, and better technique to provide extra cold electrons. Such techniques greatly enhance the production of highly charged ions from ECRISs. So far at continuous wave (CW) mode operation, up to 300 eμA of O7+ and 1.15 emA of O6+, more than 100 eμA of intermediate heavy ions for charge states up to Ar13+, Ca13+, Fe13+, Co14+, and Kr18+, and tens of eμA of heavy ions with charge states to Kr26+, Xe28+, Au35+, Bi34+, and U34+ were produced from ECRISs. At an intensity of at least 1 eμA, the maximum charge state available for the heavy ions are Xe36+, Au46+, Bi47+, and U48+. An order of magnitude enhancement for fully stripped argon ions (I≥60enA) were also achieved. This article will review the ECR ion source progress and discuss key requirement for ECRISs to produce the highly charged ion beams. copyright 1998 American Institute of Physics

Additional details

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
69
Journal Issue
2
Journal Page Range
p. 625-630.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
8. international conference on ion sources.
Dates
26-27 Jan 1998.
Place
Shirahama (Japan).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
29036913
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALUMINIUM IONS; ARGON IONS; BISMUTH IONS; CALCIUM IONS; COBALT IONS; ECR ION SOURCES; GOLD IONS; ION BEAMS; IRON IONS; KRYPTON IONS; MULTICHARGED IONS; OXYGEN IONS; URANIUM IONS; XENON IONS
Descriptors DEC
BEAMS; CHARGED PARTICLES; ION SOURCES; IONS

Optional Information

Secondary number(s)
CONF-980145--.