Published 1991
| Version v1
Book
Instability effects caused by conducting end walls in a plasma on open field lines
- 1. Texas Univ., Austin, TX (USA). Inst. for Fusion Studies
- 2. AN SSSR, Novosibirsk (USSR). Inst. Yadernoj Fiziki
Description
Two new mechanisms on how a conducting wall can affect plasma stability are presented. The instability mechanisms are of interest to the general problem of plasma stability on open field lines and they are particularly relevant to the concept of the gas dynamic trap (GDT). It is shown that the stabilizing effect of ion momentum flow through expanders with favorable field line curvature onto an insulating wall disappears in the presence of a conducting wall. With an electron temperature gradient present, a rapidly growing (compared with MHD growth rates) instability arises with end conducting plates present, while this instability is completely absent with insulating end plates. (author). 19 refs, 3 figs
Additional details
Publishing Information
- Publisher
- IAEA.
- Imprint Place
- Vienna (Austria)
- ISBN
- 92-0-130191-X
- Imprint Title
- Plasma physics and controlled nuclear fusion research 1990. V. 2
- Imprint Pagination
- 809 p.
- Journal Issue
- Suppl. 1991
- Series
- Nucl. Fusion.
- Journal Page Range
- p. 289-300.
Conference
- Title
- 13. international conference on plasma physics and controlled nuclear fusion research.
- Dates
- 1-6 Oct 1990.
- Place
- Washington, DC (USA).
INIS
- Country of Publication
- Austria
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 22082247
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, Numerical Data
- Descriptors DEI
- ELECTRIC CONDUCTIVITY; ELECTRON TEMPERATURE; MAGNETIC MIRROR CONFIGURATIONS; MOMENTUM TRANSFER; OPEN CONFIGURATIONS; PLASMA INSTABILITY; PLASMA SCRAPE-OFF LAYER; TEMPERATURE GRADIENTS; THEORETICAL DATA; TOKAMAK DEVICES; WALL EFFECTS
- Descriptors DEC
- BOUNDARY LAYERS; CLOSED PLASMA DEVICES; DATA; ELECTRICAL PROPERTIES; INFORMATION; INSTABILITY; LAYERS; MAGNETIC FIELD CONFIGURATIONS; NUMERICAL DATA; PHYSICAL PROPERTIES; THERMONUCLEAR DEVICES
Optional Information
- Secondary number(s)
- IAEA-CN--53/D-IV-9.