Published November 2016 | Version v1
Journal article

The effect of γ-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution

  • 1. Shanghai Jiaotong University, Shanghai (China). School of Nuclear Science and Engineering
  • 2. Guangxi Supervising Station for Radioactive Enviroment, Nanning (China)
  • 3. Guangxi University, Nanning (China). College of Resources and Metallurgy

Description

Silica based ammonium molybdophosphate (AMP/SiO2) adsorbent was used to remove Cs(I) from HNO3 solution. The adsorbent with different absorbed dose (0-300 kGy) was characteristed by X-ray power diffraction. The adsorption data against different γ-ray absorbed doses were analyzed by the Langmuir isotherm. The adsorption capacity decreased slightly from 23.22 to 22.37 mg/g with the increase of the absorbed dose. The breakthrough properties of Cs(I) were conducted using column packed with AMP/SiO2 before and after irradiation. The chemical stability of AMP/SiO2 at 300 kGy absorbed dose in 3 mol/L (M) HNO3 was excellent. (author)

Additional details

Publishing Information

Journal Title
Journal of Radioanalytical and Nuclear Chemistry
Journal Volume
310
Journal Issue
2
Journal Page Range
p. 905-910
ISSN
0236-5731
CODEN
JRNCDM

Optional Information

Notes
19 refs.