Published December 5, 2012
| Version v1
Journal article
Temperature impact and analytical modeling of the AlGaN/GaN-on-Si saturation drain current and transconductance
- 1. IMB-CNM-CSIC, Campus UAB, E-08193 Bellaterra, Barcelona (Spain)
- 2. CRHEA-CNRS, F-06560 Valbonne (France)
Description
The saturation drain current and the gate saturation transconductance for AlGaN/GaN on silicon (1 1 1) high-electron mobility transistors (HEMTs) have been experimentally investigated in the temperature range of 25–300 °C. An analytical physical-based closed-form is proposed for modeling the gate transconductance taking into account the polar-optical phonon scattering of the electrons in the two-dimensional electron gas HEMT channel. It is suggested that the experimental temperature dependence of T−1.1 is due to the electron channel mobility dependence coupled with the effect of the access resistances and the channel self-heating due to power dissipation. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/27/12/125010Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 27
- Journal Issue
- 12
- Journal Page Range
- [5 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45014043
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRON MOBILITY; ELECTRONS; GALLIUM NITRIDES; SATURATION; SILICON; SIMULATION; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE
- Descriptors DEC
- ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; GALLIUM COMPOUNDS; LEPTONS; MOBILITY; NITRIDES; NITROGEN COMPOUNDS; PARTICLE MOBILITY; PNICTIDES; SEMIMETALS