Published December 5, 2012 | Version v1
Journal article

Temperature impact and analytical modeling of the AlGaN/GaN-on-Si saturation drain current and transconductance

  • 1. IMB-CNM-CSIC, Campus UAB, E-08193 Bellaterra, Barcelona (Spain)
  • 2. CRHEA-CNRS, F-06560 Valbonne (France)

Description

The saturation drain current and the gate saturation transconductance for AlGaN/GaN on silicon (1 1 1) high-electron mobility transistors (HEMTs) have been experimentally investigated in the temperature range of 25–300 °C. An analytical physical-based closed-form is proposed for modeling the gate transconductance taking into account the polar-optical phonon scattering of the electrons in the two-dimensional electron gas HEMT channel. It is suggested that the experimental temperature dependence of T−1.1 is due to the electron channel mobility dependence coupled with the effect of the access resistances and the channel self-heating due to power dissipation. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/27/12/125010

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
27
Journal Issue
12
Journal Page Range
[5 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45014043
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ELECTRON MOBILITY; ELECTRONS; GALLIUM NITRIDES; SATURATION; SILICON; SIMULATION; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE
Descriptors DEC
ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; GALLIUM COMPOUNDS; LEPTONS; MOBILITY; NITRIDES; NITROGEN COMPOUNDS; PARTICLE MOBILITY; PNICTIDES; SEMIMETALS