Optical devices for extreme ultraviolet

The considerable progress in the development of extreme ultraviolet (EUV) sources such as laser-produced plasma, discharge-produced plasma, high-harmonic generation, X-ray laser, Synchrotron radiation. X-ray free electron laser will create new scientific research field and new industrial technology field. These EUV sources research have also led to progress in the development of EUV optical devices such as multilayer mirrors. This paper reviews the briefly history and recent results of multilayer optics for EUV. (author)