Published June 30, 1974
| Version v1
Patent
Open
Probe system for plasma diagnostics
Description
A probe system for plasma by SHF radiation diagnostics has been suggested. The aim of the invention is to enhance the reliability of the system by preventing the deposition or condensation of conductive particles from a plasma-upon-chamber and horn-lens antenna surface. It is achieved by screening internal surfaces of the chamber and the horn-lens antennas with a radio-transparent sublimating material of the sublimating point less than 600 deg C, e.g., polyvinylchloride
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Additional details
Additional titles
- Original title (Russian)
- Зондирующая система для диагностики плазмы
Publishing Information
- Imprint Pagination
- 2 p.
- IPC:
- Int. Cl. G01n23/24; H05h1/00.
- IPC
- Int. Cl. G01n23/24; H05h1/00.
- Patent number
- SU patent document 434298/A/
INIS
- Country of Publication
- USSR
- Country of Input or Organization
- USSR
- INIS RN
- 9377451
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- MICROWAVE RADIATION; PLASMA DIAGNOSTICS; PVC; RELIABILITY; SUBLIMATION; SURFACE COATING
- Descriptors DEC
- DEPOSITION; ELECTROMAGNETIC RADIATION; EVAPORATION; ORGANIC CHLORINE COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; ORGANIC POLYMERS; PHASE TRANSFORMATIONS; POLYMERS; POLYVINYLS; RADIATIONS
Optional Information
- Notes
- Filed 21 Sep 1972.