Published February 1, 2011 | Version v1
Journal article

Pr:YAlO3 microchip laser at 662 nm

  • 1. Czech Technical University in Prague, Faculty of Nuclear Sciences and Physical Engineering, 11519 Prague (Czech Republic)
  • 2. Crytur Ltd., 51101 Turnov (Czech Republic)

Description

A continuous-wave Pr:YAlO3 microchip laser operation at 662 nm is reported. Microchip resonator was formed by dielectric mirrors directly coated on the Pr:YAlO3 crystal front surfaces. GaN laser diode providing up to 1 W of output power at ∼ 448 nm was used as a pumping source. Output characteristics were investigated at different active medium temperature within the range of 11 – 35°C. The best result 27.4 mW of output power has been reached at 11°C at 680 mW of pumping power. The slope efficiency related to the incident pumping power was ∼ 9%

Availability note (English)

Available from http://dx.doi.org/10.1002/lapl.201010108

Additional details

Identifiers

Publishing Information

Journal Title
Laser physics letters (Internet)
Journal Volume
8
Journal Issue
2
Journal Page Range
p. 116-119
ISSN
1612-202X