Influence of process-induced stress on multiferroic properties of pulse laser deposited Bi0.7Dy0.3FeO3 thin films
Creators
- 1. Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400 076 (India)
Description
Bi0.7Dy0.3FeO3 films that are grown on a Pt/TiO2/SiO2/Si substrate by the pulsed laser deposition technique exhibit the coexistence of ferromagnetic and ferroelectric ordering at room temperature. Remarkably the removal of La from Bi0.6La0.1Dy0.3FeO3 (reported earlier) has helped us to enhance magnetic properties to a large extent while keeping the ferroelectric properties of the same order and the leakage current further reduced. Magnetic anisotropy developed non-linearly with the thickness of the films could be correlated with internal stress randomly developed during the growth process. The arbitrary change in the lattice cell parameter c with the thickness of the film also seems to be influenced by the process-induced stress. The saturation polarization (Ps) values scale with the c parameter. The information obtained by this study would be significantly useful while integrating innovative devices using such advanced multiferroic thin films
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/41/4/045003Additional details
Identifiers
- DOI
- 10.1088/0022-3727/41/4/045003;
- PII
- S0022-3727(08)63476-2;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 41
- Journal Issue
- 4
- Journal Page Range
- [5 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40060971
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANISOTROPY; BISMUTH COMPOUNDS; CRYSTAL GROWTH; DYSPROSIUM COMPOUNDS; ENERGY BEAM DEPOSITION; FERROELECTRIC MATERIALS; IRON OXIDES; LANTHANUM COMPOUNDS; LASER RADIATION; LASERS; LEAKAGE CURRENT; MAGNETIC PROPERTIES; PLATINUM; POLARIZATION; PULSED IRRADIATION; SILICON OXIDES; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TITANIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; CURRENTS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CURRENTS; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; IRON COMPOUNDS; IRRADIATION; MATERIALS; METALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PLATINUM METALS; RADIATIONS; RARE EARTH COMPOUNDS; SILICON COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS