Published March 26, 2007
| Version v1
Journal article
GaN-based semiconductor saturable absorber mirror operating around 415 nm
- 1. Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576 (Singapore)
- 2. Department of Physics, National University of Singapore, Singapore 117542 (Singapore)
- 3. Institute of Materials Research and Engineering, Singapore 117602 (Singapore)
Description
We report a broadband GaN-based semiconductor saturable absorber mirror (SESAM) operating around 415 nm. The GaInN quantum wells (QWs) acting as saturable absorbers were grown by metal-organic chemical vapor deposition (MOCVD). A broadband dielectric high-reflective distributed Bragg reflector (DBR) was deposited onto the QW sample using plasma-enhanced chemical vapor deposition (PECVD) to build the SESAM. The SESAM has a stopband of over 100 nm. The linear and nonlinear transmission/absorption from QWs and the reflectance from DBR and SESAM were studied. This SESAM can be applied in passively mode-locking blue lasers such as GaN-based semiconductor lasers for producing ultra-short optical pulses
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.07.138;
- PII
- S0040-6090(06)00959-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 10
- Journal Page Range
- p. 4484-4487
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 3. International conference on materials for advanced technologies: Symposium J-III-V- Semiconductors for microelectronic and optoelectronic applications
- Acronym
- ICMAT 2004
- Dates
- 3-8 Jul 2005
- Place
- Singapore (Singapore)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018685
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; GALLIUM NITRIDES; QUANTUM WELLS; SEMICONDUCTOR LASERS; SEMICONDUCTOR MATERIALS
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; GALLIUM COMPOUNDS; LASERS; MATERIALS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SOLID STATE LASERS; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.