Published March 26, 2007 | Version v1
Journal article

GaN-based semiconductor saturable absorber mirror operating around 415 nm

  • 1. Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576 (Singapore)
  • 2. Department of Physics, National University of Singapore, Singapore 117542 (Singapore)
  • 3. Institute of Materials Research and Engineering, Singapore 117602 (Singapore)

Description

We report a broadband GaN-based semiconductor saturable absorber mirror (SESAM) operating around 415 nm. The GaInN quantum wells (QWs) acting as saturable absorbers were grown by metal-organic chemical vapor deposition (MOCVD). A broadband dielectric high-reflective distributed Bragg reflector (DBR) was deposited onto the QW sample using plasma-enhanced chemical vapor deposition (PECVD) to build the SESAM. The SESAM has a stopband of over 100 nm. The linear and nonlinear transmission/absorption from QWs and the reflectance from DBR and SESAM were studied. This SESAM can be applied in passively mode-locking blue lasers such as GaN-based semiconductor lasers for producing ultra-short optical pulses

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.07.138;
PII
S0040-6090(06)00959-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
10
Journal Page Range
p. 4484-4487
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
3. International conference on materials for advanced technologies: Symposium J-III-V- Semiconductors for microelectronic and optoelectronic applications
Acronym
ICMAT 2004
Dates
3-8 Jul 2005
Place
Singapore (Singapore)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39018685
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; GALLIUM NITRIDES; QUANTUM WELLS; SEMICONDUCTOR LASERS; SEMICONDUCTOR MATERIALS
Descriptors DEC
CHEMICAL COATING; DEPOSITION; GALLIUM COMPOUNDS; LASERS; MATERIALS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SOLID STATE LASERS; SURFACE COATING

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.