Published July 2014
| Version v1
Journal article
Characterization of GaN-based p-channel device structures at elevated temperatures
- 1. GaN Device Technology, RWTH Aachen, D-52074 Aachen (Germany)
Description
The interest in GaN for logic applications is increasing. With complementary logic architectures requiring the lowest power consumption, the need for GaN-based p-channel transistors is growing. Yet, the knowledge and the maturity of p-channel devices is far behind those of their n-channel counterparts. By analysing p-channel transistors with a high on/off ratio and a low subthreshold swing under elevated temperatures, we attempt to improve this situation. This is the first report on transistor operation at temperatures as high as 175 °C. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/29/7/075002Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 29
- Journal Issue
- 7
- Journal Page Range
- [7 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46083638
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- GALLIUM NITRIDES; LOGIC CIRCUITS; OPERATION; TEMPERATURE DEPENDENCE; TRANSISTORS
- Descriptors DEC
- ELECTRONIC CIRCUITS; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES