Published July 2014 | Version v1
Journal article

Characterization of GaN-based p-channel device structures at elevated temperatures

  • 1. GaN Device Technology, RWTH Aachen, D-52074 Aachen (Germany)

Description

The interest in GaN for logic applications is increasing. With complementary logic architectures requiring the lowest power consumption, the need for GaN-based p-channel transistors is growing. Yet, the knowledge and the maturity of p-channel devices is far behind those of their n-channel counterparts. By analysing p-channel transistors with a high on/off ratio and a low subthreshold swing under elevated temperatures, we attempt to improve this situation. This is the first report on transistor operation at temperatures as high as 175 °C. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/29/7/075002

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
29
Journal Issue
7
Journal Page Range
[7 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46083638
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
GALLIUM NITRIDES; LOGIC CIRCUITS; OPERATION; TEMPERATURE DEPENDENCE; TRANSISTORS
Descriptors DEC
ELECTRONIC CIRCUITS; GALLIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES