Published April 1, 2019
| Version v1
Journal article
A general method to construct dislocations in atomistic simulations
Creators
- 1. Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)
Description
An important aspect of atomistic simulations of dislocations is the construction of the initial dislocation configurations. However, limited configurations can be constructed by previous methods, impeding the simulations of a general dislocation configuration in real materials. In this paper, we develop a simple and general method for constructing dislocations with arbitrary shapes specified by the users, realising the Volterra process at the atomic level. Examples of its applications to a dislocation helix, the partial dislocations, the multi-dislocation configurations, and the dislocations in the imperfect crystal are presented, showing the capacity and robustness of the present method. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-651X/ab021aAdditional details
Identifiers
Publishing Information
- Journal Title
- Modelling and Simulation in Materials Science and Engineering
- Journal Volume
- 27
- Journal Issue
- 3
- Journal Page Range
- [12 p.]
- ISSN
- 0965-0393
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54021160
- Subject category
- S36: MATERIALS SCIENCE; S97: MATHEMATICAL METHODS AND COMPUTING;
- Descriptors DEI
- COMPUTERIZED SIMULATION; CONFIGURATION; CRYSTALS; DISLOCATIONS; MATERIALS; SHAPE
- Descriptors DEC
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; LINE DEFECTS; SIMULATION