Published April 1, 2019 | Version v1
Journal article

A general method to construct dislocations in atomistic simulations

  • 1. Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)

Description

An important aspect of atomistic simulations of dislocations is the construction of the initial dislocation configurations. However, limited configurations can be constructed by previous methods, impeding the simulations of a general dislocation configuration in real materials. In this paper, we develop a simple and general method for constructing dislocations with arbitrary shapes specified by the users, realising the Volterra process at the atomic level. Examples of its applications to a dislocation helix, the partial dislocations, the multi-dislocation configurations, and the dislocations in the imperfect crystal are presented, showing the capacity and robustness of the present method. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-651X/ab021a

Additional details

Identifiers

Publishing Information

Journal Title
Modelling and Simulation in Materials Science and Engineering
Journal Volume
27
Journal Issue
3
Journal Page Range
[12 p.]
ISSN
0965-0393

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54021160
Subject category
S36: MATERIALS SCIENCE; S97: MATHEMATICAL METHODS AND COMPUTING;
Descriptors DEI
COMPUTERIZED SIMULATION; CONFIGURATION; CRYSTALS; DISLOCATIONS; MATERIALS; SHAPE
Descriptors DEC
CRYSTAL DEFECTS; CRYSTAL STRUCTURE; LINE DEFECTS; SIMULATION