Published June 27, 1988
| Version v1
Journal article
Chemical precursor to optical damage detected by laser ionization mass spectrometry
Creators
- 1. Chemical and Laser Sciences Division, MS G738, Los Alamos National Laboratory, Los Alamos, New Mexico 87545
Description
Mass spectrometry was used in conjunction with Nomarski microscopy to characterize the initiation of optical damage in selected commercial optics. The reflective optics (351 nm) consisted of Sc2O3/SiO2 multilayer coatings on 7940 (glass) substrates. These samples were exposed to loosely focused 1.06 μm, 10 ns pulses at 10 Hz. At fluences above 100 mJ/cm2, transient iron signals were observed at each increasing fluence level, with concomitant appearance of small circular (10 μm) pits in the surface. The latter was observed by Nomarski microscopy. These small pits were also associated with macroscopic damage features resulting from threshold damage testing
Additional details
Publishing Information
- Journal Title
- Appl. Phys. Lett.
- Journal Volume
- 52
- Journal Issue
- 26
- Series
- Appl. Phys. Lett.
- Journal Page Range
- 2205-2207
- ISSN
- 0003-6951
- CODEN
- APPLA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19082220
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COATINGS; GLASS; INFRARED RADIATION; LASER RADIATION; MASS SPECTROSCOPY; OPTICAL MICROSCOPY; PHYSICAL RADIATION EFFECTS; SCANDIUM OXIDES; SILICON OXIDES; SURFACE COATING
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; ELECTROMAGNETIC RADIATION; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; SCANDIUM COMPOUNDS; SILICON COMPOUNDS; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS