Published July 1, 2012 | Version v1
Journal article

Vacancy-type defects in InxGa1-xN alloys probed using a monoenergetic positron beam

  • 1. Division of Applied Physics, Faculty of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)
  • 2. Nanosystem Research Institute (NRI) "RICS," National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568 (Japan)
  • 3. State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871 (China)
  • 4. Wide Bandgap Material Group, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044 (Japan)

Description

Native defects in InxGa1-xN grown by plasma-assisted molecular beam epitaxy were probed by a monoenergetic positron beam. Doppler broadening spectra of the annihilation radiation were measured, and these were compared with results obtained using first-principles calculation. The defect concentration increased with increasing In composition x and reached the maximum at x = 0.44∼0.56. A clear correlation between the line-width of photoluminescence and the defect concentration was obtained. The major defect species detected by positron annihilation was identified as cation vacancies coupled with multiple nitrogen vacancies (VNs), and their introduction mechanism is discussed in terms of the strain energy due to bond-length/angle distortions and the suppression of the VN formation energy by neighboring In atoms.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
112
Journal Issue
1
Journal Page Range
p. 014507-014507.5
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2012 American Institute of Physics