Published June 15, 2009 | Version v1
Journal article

Nitrogen-assisted removal of deuterated carbon layers

  • 1. Alfven Laboratory, Royal Institute of Technology, Association EURATOM - VR, 100-44 Stockholm (Sweden)
  • 2. Institute for Energy Research (IEF-4), Forschungszentrum Juelich, Association EURATOM - FZJ, Juelich (Germany)
  • 3. Institute of Physics, University of Basel, Association EURATOM - CRPP, Basel (Switzerland)

Description

Deuterated carbon films prepared in laboratory and boronised films prepared in the TEXTOR tokamak were exposed to hydrogen-nitrogen plasmas in order to determine erosion characteristics and fuel removal efficiency. Exposures were performed in: (i) TEXTOR tokamak during ion cyclotron heated wall conditioning discharges (ICWC) and (ii) TOMAS magnetic plasma facility in radio frequency-assisted glow discharges. The essential results are: (i) films exposed in TEXTOR are not affected: deuterium and carbon content does not decrease and the morphology is unchanged, and (ii) deuterium and carbon contents in films exposed in TOMAS is reduced by 30-60% after 2 h of cleaning and topographical changes are noted. The study shows that while exposure to H2-N2 laboratory plasma removes a-C:D films, no effect is seen at the position of the sample exposure during tokamak ICWC plasmas. It also indicates that the removal efficiency is only weakly related to nitrogen, since the highest removal efficiency is seen with pure hydrogen plasma. A comparison to oxygen-assisted fuel removal is given.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2009.01.180

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2009.01.180;
PII
S0022-3115(09)00200-1;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
390-391
Journal Page Range
p. 647-650
ISSN
0022-3115
CODEN
JNUMAM

Conference

Title
18. international conference on plasma-surface interactions in controlled fusion device
Dates
26-30 May 2008
Place
Toledo, Castilla-La Mancha (Spain)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.