Published October 1, 2016 | Version v1
Journal article

High-gain complementary metal-oxide-semiconductor inverter based on multi-layer WSe2 field effect transistors without doping

  • 1. Department of Electrical and Computer Engineering, ISRC(Inter-University Semiconductor Research Center), Seoul National University, Seoul 151-744 (Korea, Republic of)

Description

A high-gain complementary metal-oxide-semiconductor (CMOS) logic inverter was implemented by fabricating p - and n -type field effect transistors (FETs) based on multi-layer WSe2 on the same wafer. Au as a high work-function metal is contacted to WSe2 for the source/drain of the p -type FET. The n -type FET has an Al electrode contacted to WSe2 for the source/drain. Both FETs were designed to have similar on-current densities (>10−7 A μ m−1) and high on/off current ratios (>106). The inverter shows excellent switching characteristics including relatively high voltage gains (>25) and high noise margins (>0.9) in the range of supply voltage from 2 V to 8 V. This work has a great significance in the realization of a CMOS logic gate based on WSe2 without an additional doping scheme. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/31/10/105001

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
31
Journal Issue
10
Journal Page Range
[6 p.]
ISSN
0268-1242
CODEN
SSTEET