Published March 1976
| Version v1
Journal article
Sputtering of thin films of uranium and UO2 under irradiation
Creators
- 1. CEA Centre d'Etudes Nucleaires de Fontenay-aux-Roses, 92 (France). Section d'Etude des Solides Irradies
Description
The sputtering rates of thin films of fissile materials (U and UO2) have been measured by fissiography and alphagraphy after neutron irradiation at 20 K and 350 K. It is demonstrated that the observed sputtering arises from the thermal effects induced by fission fragments. (Auth.)
Additional details
Additional titles
- Original title (French)
- Pulverisation de films minces d'uranium et d'UO
Identifiers
Publishing Information
- Journal Title
- Journal of Nuclear Materials
- Journal Volume
- 59
- Journal Issue
- 3
- Series
- J. Nucl. Mater.
- Journal Page Range
- 321-324
- ISSN
- 0022-3115
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 7268148
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- FILMS; FISSION FRAGMENTS; IRRADIATION; MEDIUM TEMPERATURE; NEUTRONS; SPUTTERING; URANIUM; URANIUM DIOXIDE; VERY LOW TEMPERATURE
- Descriptors DEC
- ACTINIDE COMPOUNDS; ACTINIDES; BARYONS; CHALCOGENIDES; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; HADRONS; METALS; NUCLEONS; OXIDES; OXYGEN COMPOUNDS; URANIUM COMPOUNDS; URANIUM OXIDES
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent