Published August 20, 2007 | Version v1
Journal article

Epitaxial growth by pulsed laser deposition of Er-doped Sc2O3 films on sesquioxides monitored in situ by reflection high energy electron diffraction

  • 1. Institute of Laser-Physics, University of Hamburg, Luruper Chaussee 149, 22761 Hamburg (Germany)

Description

In this letter, the authors report on the epitaxial growth by pulsed laser deposition of Sc2O3 and Er(5%):Sc2O3 films on {100} and {111} oriented Sc2O3. They observed layer-by-layer growth in the orientation defined by the substrate. This was indicated by reflection high energy electron diffraction as intensity oscillations of the specularly reflected electron beam. A monolayer-smooth film surface was observed by atomic force microscopy. Such a growth behavior was also achieved during initial growth of Sc2O3 on {100} oriented Y2O3. Additional x-ray diffraction analysis shows good agreement with the growth behavior mentioned above

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
91
Journal Issue
8
Journal Page Range
p. 083103-083103.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2007 American Institute of Physics