Published August 30, 2019 | Version v1
Journal article

Few-layer bismuthene for robust ultrafast photonics in C-Band optical communications

  • 1. School of Physics and Information Technology, Shaanxi Normal University, Shaanxi province, Xi'an People's Republic of China (China)
  • 2. Shenzhen Key Laboratory of Two-Dimensional Materials and Devices/Shenzhen Engineering Laboratory of Phosphorene and Optoelectronics, Collaborative Innovation Center for Optoelectronic Science and Technology, Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong, Guangdong province, Shenzhen (China)

Description

The ultrafast photonics of different conventional two-dimensional (2D) materials have been studied intensively. Few-layer structure bismuthene has been reported as a new type of 2D material with high efficient electronics, strong mechanics and outstanding photonics properties. In this paper, a robust ultrafast pulse generation in communications-Band (C-Band) based on few-layer bismuthene has been reported. The characteristics and the ultrafast optical nonlinear properties of few-layer bismuthene have been investigated experimentally. The optical induced deposition method is employed to fabricate the saturable absorber based on bismuthene (BiSA). Most importantly, we also utilize BiSA for the ultrafast photonics, which demonstrates that a high-splitting-threshold robust ultrafast fiber laser with 1.3-ps pulse duration at 1531 nm has been obtained in the experiments. Even though we increase the pump power from the self-starting threshold (i.e. 86 mW) to 314 mW, the soliton pulse does not split. Moreover, the high-splitting-threshold laser operation can be achieved stably even if the lasers are exposed in air for at least half a year. It is demonstrated that the proposed bismuthene nonlinear components can be potentially applied to the optical communications with C-Band (i.e. 1530–1565 nm wavelength) to broaden the communications window. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/ab2150

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
30
Journal Issue
35
Journal Page Range
[8 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51054132
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
AIR; BISMUTH COMPOUNDS; COMMUNICATIONS; DEPOSITION; LASERS; LAYERS; NONLINEAR OPTICS; PULSES; SOLITONS; TWO-DIMENSIONAL SYSTEMS; WAVELENGTHS
Descriptors DEC
CRYSTAL LATTICES; CRYSTAL STRUCTURE; FLUIDS; GASES; OPTICS; QUASI PARTICLES