Published May 1, 2008 | Version v1
Journal article

Evaluation of fast EUV scintillator using 13.9 nm x-ray laser

  • 1. Advanced Photon Research Center, Japan Atomic Energy Agency, 8-1, Umemidai, Kizugawa, Kyoto 619-0215 (Japan)
  • 2. Institute of Laser Engineering, Osaka University, 2-6, Yamadaoka, Suita, Osaka 565-0871 (Japan)
  • 3. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)

Description

The nickel-like silver x-ray laser with the wavelength of 13.9 nm is used as a high power EUV excitation source to evaluate a scintillator for EUV lithography. The time resolved spectrum of zinc oxide exciton emission at around 380 nm was observed. The determined fluorescence lifetime of 1.1 ns is sufficiently short for characterizing EUV lithography light sources having a few nanoseconds duration. It is also shown that the x-ray laser is an excellent tool for spectroscopic characterization of materials intended for next-generation lithography applications

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/112/4/042058

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
112
Journal Issue
4
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
5. international conference on inertial fusion sciences and applications
Acronym
IFSA2007
Dates
9-14 Sep 2007
Place
Kobe (Japan)