Published April 7, 1986
| Version v1
Journal article
Temperature-dependent pinning at the Al/n-GaAs (110) interface
Creators
- 1. Stanford Electronics Laboratories, Stanford University, Stanford, California 94305
Description
It is shown that at the Al/n-GaAs(110) interface grown in ultrahigh vacuum at -80 0C the Fermi level remains unpinned at least up to a 3 monolayer coverage. In contrast, at room temperature the pinning near midgap is established after a deposition of approximately 1 monolayer of Al. The low-temperature behavior is correlated with the growth of a more uniform overlayer which inhibits cluster and defect formation. This result provides a critical test of models of Schottky barrier formation
Additional details
Publishing Information
- Journal Title
- Appl. Phys. Lett.
- Journal Volume
- 48
- Journal Issue
- 14
- Series
- Appl. Phys. Lett.
- Journal Page Range
- 919-921
- ISSN
- 0003-6951
- CODEN
- APPLA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17050095
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; CRYSTAL DEFECTS; ELECTRIC CONTACTS; FABRICATION; GALLIUM ARSENIDES; LAYERS; POTENTIALS; SCHOTTKY BARRIER DIODES; SURFACE COATING; TEMPERATURE DEPENDENCE
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL STRUCTURE; DEPOSITION; ELECTRICAL EQUIPMENT; ELEMENTS; EQUIPMENT; GALLIUM COMPOUNDS; METALS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES