On pinning-depinning and microkink-flow in solid state dewetting: Insights by in-situ ESEM on Al thin films
Creators
- 1. Max-Planck-Institut für Eisenforschung GmbH, D-40237, Düsseldorf (Germany)
- 2. Scientific Center for Optical and Electron Microscopy, ETH Zürich, 8093, Zürich (Switzerland)
- 3. Max-Planck-Institute of Colloids and Interfaces, Department of Colloid Chemistry, Research Campus Golm, 14424, Potsdam (Germany)
- 4. Fritz Haber Institute of the Max-Planck-Society, 14195, Berlin (Germany)
- 5. Max-Planck-Institut für Intelligente Systeme, 70569, Stuttgart (Germany)
- 6. Aix-Marseille Univ, CNRS, CINaM, Marseille (France)
- 7. Materials Analytics, RWTH Aachen University, Kopernikusstr. 10, 52074, Aachen (Germany)
Description
The dynamics of solid state dewetting phenomena of a 50 nm thick, mazed bicrystalline Al film on single crystalline α-Al2O3 (sapphire) substrates was studied in-situ using an environmental scanning electron microscope (ESEM). The bicrystalline Al thin films served as a model system where the influence of grain boundaries and texture effects are well determined compared to polycrystalline films. The experiments were performed in controlled oxidizing and reducing atmospheres at 773 K and 823 K, respectively, to shed light on the differences in dewetting mechanisms and dynamics. While the reducing atmosphere led to spontaneous dewetting at 823 K after an incubation time of a few minutes, a hierarchical dewetting process was observed for the sluggish dewetting under oxidizing conditions. Voids initiated at (substrate or surface) defects and expanded trying to maintain a hexagonal shape. Pinning and depinning processes led to a discontinuous void growth and irregular void shapes including finger instabilities. As a consequence, the void growth followed a variety of power law exponents between 0.10 and 0.55. A new microkink-flow mechanism was discovered at the terminating Al planes at the void.
Additional details
Identifiers
- DOI
- 10.1016/j.actamat.2018.11.028;
- PII
- S1359645418309042;
Publishing Information
- Journal Title
- Acta Materialia
- Journal Volume
- 165
- Journal Page Range
- p. 153-163
- ISSN
- 1359-6454
- CODEN
- ACMAFD
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55030515
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DEFECTS; GRAIN BOUNDARIES; INCUBATION; INSTABILITY; MONOCRYSTALS; POLYCRYSTALS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SOLIDS; SUBSTRATES; TEXTURE; THIN FILMS
- Descriptors DEC
- CORUNDUM; CRYSTALS; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; MICROSTRUCTURE; MINERALS; OXIDE MINERALS
Optional Information
- Copyright
- Copyright (c) 2018 Published by Elsevier Ltd on behalf of Acta Materialia Inc.