Published February 2019 | Version v1
Journal article

On pinning-depinning and microkink-flow in solid state dewetting: Insights by in-situ ESEM on Al thin films

  • 1. Max-Planck-Institut für Eisenforschung GmbH, D-40237, Düsseldorf (Germany)
  • 2. Scientific Center for Optical and Electron Microscopy, ETH Zürich, 8093, Zürich (Switzerland)
  • 3. Max-Planck-Institute of Colloids and Interfaces, Department of Colloid Chemistry, Research Campus Golm, 14424, Potsdam (Germany)
  • 4. Fritz Haber Institute of the Max-Planck-Society, 14195, Berlin (Germany)
  • 5. Max-Planck-Institut für Intelligente Systeme, 70569, Stuttgart (Germany)
  • 6. Aix-Marseille Univ, CNRS, CINaM, Marseille (France)
  • 7. Materials Analytics, RWTH Aachen University, Kopernikusstr. 10, 52074, Aachen (Germany)

Description

The dynamics of solid state dewetting phenomena of a 50 nm thick, mazed bicrystalline Al film on single crystalline α-Al2O3 (sapphire) substrates was studied in-situ using an environmental scanning electron microscope (ESEM). The bicrystalline Al thin films served as a model system where the influence of grain boundaries and texture effects are well determined compared to polycrystalline films. The experiments were performed in controlled oxidizing and reducing atmospheres at 773 K and 823 K, respectively, to shed light on the differences in dewetting mechanisms and dynamics. While the reducing atmosphere led to spontaneous dewetting at 823 K after an incubation time of a few minutes, a hierarchical dewetting process was observed for the sluggish dewetting under oxidizing conditions. Voids initiated at (substrate or surface) defects and expanded trying to maintain a hexagonal shape. Pinning and depinning processes led to a discontinuous void growth and irregular void shapes including finger instabilities. As a consequence, the void growth followed a variety of power law exponents between 0.10 and 0.55. A new microkink-flow mechanism was discovered at the terminating Al planes at the void.

Additional details

Identifiers

DOI
10.1016/j.actamat.2018.11.028;
PII
S1359645418309042;

Publishing Information

Journal Title
Acta Materialia
Journal Volume
165
Journal Page Range
p. 153-163
ISSN
1359-6454
CODEN
ACMAFD

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
55030515
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DEFECTS; GRAIN BOUNDARIES; INCUBATION; INSTABILITY; MONOCRYSTALS; POLYCRYSTALS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SOLIDS; SUBSTRATES; TEXTURE; THIN FILMS
Descriptors DEC
CORUNDUM; CRYSTALS; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; MICROSTRUCTURE; MINERALS; OXIDE MINERALS

Optional Information

Copyright
Copyright (c) 2018 Published by Elsevier Ltd on behalf of Acta Materialia Inc.