Origin of residual gases of orbitron getter-ion pump

For the first time differentiated are the processes, simultaneously occurring in an orbitron getter-ion pump (OGIP), and clarified is the genesis of the OGIP residual medium at maximum pressure. It is shown that excluding noble gases, being ''memory'' about air medium, the presence of all the other components is caused by a number of physico-chemical reactions on the surface of evaporator and titanium sorbing film. Interfering passing of these processes one can desirably change gas medium content and phone pressure in the system