Published July 20, 2016
| Version v1
Journal article
Influence of oxygen vacancies on the photoresponse of β -Ga2O3/SiC n – n type heterojunctions
- 1. Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876 (China)
- 2. Physics of Department, The State University of New York at Potsdam, Potsdam, NY 13676-2294 (United States)
Description
β -Ga2O3/4H-SiC n – n type heterojunctions have been fabricated by depositing high quality β -Ga2O3 films on c -axis orientation n -type 4H-SiC substrates using laser molecular beam expitaxy. The influences of oxygen vacancies on the junction performances are investigated. It is found that the existence of oxygen vacancies degrades the rectifying and photoresponse properties of the heterojunctions. A large rectification ratio of 1900, a high 254 nm ultraviolet photosensitivity of 6308% and a zero response of 365 nm ultraviolet have been achieved by reducing oxygen vacancies. It is supposed that the oxygen vacancies in Ga2O3 affect the depletion layer of the n – n junction greatly. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/49/28/285111Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 49
- Journal Issue
- 28
- Journal Page Range
- [6 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49018877
- Subject category
- S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- DEPLETION LAYER; DEPOSITS; FILMS; GALLIUM OXIDES; HETEROJUNCTIONS; LASERS; MOLECULAR BEAMS; ORIENTATION; PERFORMANCE; PHOTOSENSITIVITY; SILICON; SILICON CARBIDES; SUBSTRATES; ULTRAVIOLET RADIATION; VACANCIES
- Descriptors DEC
- BEAMS; CARBIDES; CARBON COMPOUNDS; CHALCOGENIDES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ELEMENTS; GALLIUM COMPOUNDS; LAYERS; OXIDES; OXYGEN COMPOUNDS; POINT DEFECTS; RADIATIONS; SEMICONDUCTOR JUNCTIONS; SEMIMETALS; SENSITIVITY; SILICON COMPOUNDS