Published 1979 | Version v1
Book Metadata-only

Comparison between electron impact ion sources of two kinds

Creators

  • 1. Osaka Prefectural Univ., Sakai (Japan)

Description

no abstract available

Additional details

Publishing Information

Publisher
Inst. of Electr. Eng. of Japan.
Imprint Place
Tokyo, Japan
Imprint Title
Proceedings of the third symposium on ion sources and application technology
Journal Page Range
p. 63-66.

Conference

Title
3. symposium on ion sources and application technology.
Dates
19 - 22 Feb 1979.
Place
Tokyo, Japan.

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
11539187
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Conference, Numerical Data, No Abstract
Descriptors DEI
ANODES; BEAM CURRENTS; BEAM EXTRACTION; CATHODES; ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRON BEAM ION SOURCES; EXPERIMENTAL DATA; GRAPHS; ION PAIRS; IONS; KEV RANGE 01-10; LOW PRESSURE; MAGNETIC FIELDS
Descriptors DEC
CHARGED PARTICLES; CURRENTS; DATA; DATA FORMS; ELECTRODES; ENERGY RANGE; INFORMATION; ION SOURCES; KEV RANGE; NUMERICAL DATA

Optional Information

Notes
Published in summary form only.