Pseudospark as an electron beam source
Creators
- 1. Maryland Univ., College Park, MD (USA). Lab. for Plasma Research
Description
The pseudospark discharge phenomenon with interesting charged particle emission characteristics was introduced in 1978. This discharge utilizes the breakdown characteristics of the lower pressure side of the Paschen curve in a single or multigap parallel plate electrode geometry. To investigate the electron beam produced, the authors have constructed a modular type multigap pseudospark chamber. By using radiachromic film which gives a linear response up to an absorbed dose of 188 rad, the spatial profile of the beam was determined. At an axial distance of 3cm from the anode a beam diameter of 1.5 mm FWHM was found. Measurements of the beam emittance using an emittance meter consisting of slits and radiachromic film is presently underway and preliminary results are presented
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Proceedings of the 1989 IEEE international conference on plasma science (Abstracts)
- Imprint Pagination
- 180 p.
- Journal Page Range
- p. 100.
Conference
- Title
- Institute of Electrical and Electronics Engineers international conference on plasma science.
- Dates
- 22-24 May 1989.
- Place
- Buffalo, NY (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 21041209
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM EXTRACTION; BREAKDOWN; CAPACITORS; DRIFT TUBES; ELECTRON BEAMS; ELECTRON SOURCES; EMISSION SPECTRA; FARADAY CUPS; GLOW DISCHARGES; HOLLOW CATHODES; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; ROGOWSKI COIL
- Descriptors DEC
- BEAM MONITORS; BEAMS; CATHODES; ELECTRIC COILS; ELECTRIC DISCHARGES; ELECTRICAL EQUIPMENT; ELECTRODES; ENERGY STORAGE SYSTEMS; EQUIPMENT; LEPTON BEAMS; MEASURING INSTRUMENTS; MONITORS; PARTICLE BEAMS; PARTICLE SOURCES; RADIATION SOURCES; SPECTRA
Optional Information
- Secondary number(s)
- CONF-8905184--.