Published December 2009
| Version v1
Journal article
Fabrication of three-dimensional microchannels inside silicon using a femtosecond laser
- 1. Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Shannxi Key Lab of Information Photonic Technique, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xianning-xilu 28, Xi'an, 710049 (China)
Description
We report on photo-induced microchannels created within single-crystal silicon using 800 nm femtosecond laser pulses. The 800 nm wavelength is in the absorption region of silicon. Using combined transverse scanning and longitudinal scanning, we can fabricate arbitrary three-dimensional microchannels in the interior of silicon, to a depth of several hundred micrometers, without surface damage. The diameter of the photo-induced microchannels can be controlled by varying laser power, scan velocity and focal depth
Availability note (English)
Available from http://dx.doi.org/10.1088/0960-1317/19/12/125007Additional details
Identifiers
- DOI
- 10.1088/0960-1317/19/12/125007;
- PII
- S0960-1317(09)26742-8;
Publishing Information
- Journal Title
- Journal of Micromechanics and Microengineering. Structures, Devices and Systems
- Journal Volume
- 19
- Journal Issue
- 12
- Journal Page Range
- [4 p.]
- ISSN
- 0960-1317
- CODEN
- JMMIEZ
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45007766
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION; FABRICATION; LASERS; MONOCRYSTALS; PULSES; SILICON; SURFACES; THREE-DIMENSIONAL CALCULATIONS; WAVELENGTHS
- Descriptors DEC
- CRYSTALS; ELEMENTS; SEMIMETALS; SORPTION