Published October 2006 | Version v1
Journal article

Ferroelectric and dielectric properties of Ba0.5Sr0.5(Ti0.80Sn0.20)O3 thin films grown by the soft chemical method

  • 1. Laboratorio Interdisciplinar em Ceramica, Departamento de Fisico-quimica, Instituto de Quimica, Universidade Estadual Paulista, R. Francisco Degni, s/n, Bairro Quitandinha, CEP 14801-970 Araraquara - SP (Brazil)
  • 2. Laboratorio Interdisciplinar de Materiais Ceramicos, Centro Interdisciplinar de Pesquisa e Pos-Graduacao, Universidade Estadual de Ponta Grossa, Av. Gal. Carlos Cavalcanti, 4748, Campus - Uvaranas, CEP 84035-900 Ponta Grossa - PR (Brazil)
  • 3. Laboratorio Interdisciplinar de Eletroquimica e Ceramica, Departamento de Quimica, Universidade Federal de Sao Carlos, Rod. Washington Luiz, km 235, C.P. 676, CEP 13565-905 Sao Carlos - SP (Brazil)

Description

Polycrystalline Ba0.5Sr0.5(Ti0.80Sn0.20)O3 (BST:Sn) thin films with a perovskite structure were prepared by the soft chemical method on a platinum-coated silicon substrate from spin-coating technique. The resulting thin films showed a dense structure with uniform grain size distribution. The dielectric constant of the films estimated from C-V curve is around 1134 and can be ascribed to a reduction in the oxygen vacancy concentration. The ferroelectric nature of the film indicated by butterfly-shaped C-V curves and confirmed by the hysteresis curve, showed remnant polarization of 14μC/cm2 and coercive field of 74kV/cm at frequency of 1MHz. At the same frequency, the leakage current density at 1.0V is equal to 1.5x10-7A/cm2. This work clearly reveals the highly promising potential of BST:Sn for application in memory devices

Additional details

Identifiers

DOI
10.1016/j.jssc.2006.06.023;
PII
S0022-4596(06)00365-3;

Publishing Information

Journal Title
Journal of Solid State Chemistry
Journal Volume
179
Journal Issue
10
Journal Page Range
p. 2972-2976
ISSN
0022-4596
CODEN
JSSCBI

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.