Published February 15, 2007 | Version v1
Journal article

Chemical analysis of semiconducting and metallic SmS thin films by X-ray photoelectron spectroscopy

  • 1. Materials Research Laboratory, NGK Insulators, Ltd., 2-56 Suda-cho, Mizuho-ku, Nagoya 467-8530 (Japan)
  • 2. Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso, Showa-ku, Nagoya 466-8555 (Japan)

Description

We studied the chemical state of semiconducting and metallic SmS thin films by X-ray photoelectron spectroscopy (XPS), which were fabricated using dual-target magnetron sputtering by controlling the power applied to both metal and chalcogenide targets. On the basis of the valence band spectra obtained, it was suggested that semiconducting SmS has the final state corresponding to the Sm2+(4f6) configuration below the Fermi level, and metallic SmS has mainly the Sm3+(4f5) final state and a virtual band state in the Sm 5d band, contributing to the delocalization of 4f electrons and the emergence of metallic conductivity (4f6d0-4f5d1). Thus, the spectra of our fabricated SmS thin films correspond to the band structure obtained from the dielectric property. This is the first work performed on the intrinsically prepared metallic SmS while the former works done for the sample transformed from semiconductor to metal phase by hard polishing

Additional details

Identifiers

DOI
10.1016/j.apsusc.2006.08.011;
PII
S0169-4332(06)01083-X;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
253
Journal Issue
8
Journal Page Range
p. 3856-3859
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.