Equilibrium and resistive steady state of an axisymmetric co-axial helicity injection plasma
Creators
- 1. Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027 (United States)
- 2. Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)
Description
Steady state (∂B/∂t=∂v/∂t=0) coaxial helicity injection (CHI) has a purely electrostatic E =-∇Φ(ψ,θ) field. The electrostatic potential implies an ExB flow that scales with the externally imposed voltage and is negligibly affected by plasma dissipation. Both the electrostatic potential and the magnetic configuration in the resistive steady state description can be significantly different from those in a Grad-Shafranov open field line equilibrium for CHI discharges. The Bx∇Φ flow in a resistive steady state induces localized perpendicular current for force balance with the plasma inertia. The perpendicular current can drive far stronger parallel current that is localized poloidally on a flux surface. This effect is pronounced for CHI discharges because the desirable CHI hollow current profile has interior high q and there is a magnetic X point in the neighborhood of the absorber, where a large ψ gradient of q and poloidal field strength exists
Additional details
Identifiers
- DOI
- 10.1063/1.1599358;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 10
- Journal Issue
- 9
- Journal Page Range
- p. 3661-3673
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35067991
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- CHARGED-PARTICLE TRANSPORT; ELECTRIC POTENTIAL; EQUILIBRIUM; HELICITY; PLASMA
- Descriptors DEC
- PARTICLE PROPERTIES; RADIATION TRANSPORT
Optional Information
- Notes
- (c) 2003 American Institute of Physics.