Published September 2003 | Version v1
Journal article

Equilibrium and resistive steady state of an axisymmetric co-axial helicity injection plasma

  • 1. Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027 (United States)
  • 2. Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

Description

Steady state (∂B/∂t=∂v/∂t=0) coaxial helicity injection (CHI) has a purely electrostatic E =-∇Φ(ψ,θ) field. The electrostatic potential implies an ExB flow that scales with the externally imposed voltage and is negligibly affected by plasma dissipation. Both the electrostatic potential and the magnetic configuration in the resistive steady state description can be significantly different from those in a Grad-Shafranov open field line equilibrium for CHI discharges. The Bx∇Φ flow in a resistive steady state induces localized perpendicular current for force balance with the plasma inertia. The perpendicular current can drive far stronger parallel current that is localized poloidally on a flux surface. This effect is pronounced for CHI discharges because the desirable CHI hollow current profile has interior high q and there is a magnetic X point in the neighborhood of the absorber, where a large ψ gradient of q and poloidal field strength exists

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
10
Journal Issue
9
Journal Page Range
p. 3661-3673
ISSN
1070-664X
CODEN
PHPAEN

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35067991
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CHARGED-PARTICLE TRANSPORT; ELECTRIC POTENTIAL; EQUILIBRIUM; HELICITY; PLASMA
Descriptors DEC
PARTICLE PROPERTIES; RADIATION TRANSPORT

Optional Information

Notes
(c) 2003 American Institute of Physics.