Published June 2, 2014 | Version v1
Journal article

Optical properties of strain-free AlN nanowires grown by molecular beam epitaxy on Si substrates

  • 1. Department of Electrical and Computer Engineering, McGill University, 3480 University Street, Montreal, Quebec H3A 0E9 (Canada)
  • 2. Department of Chemistry, McGill University, 801 Sherbrooke St West, Montreal, Quebec H3A 0B8 (Canada)
  • 3. Department of Electrical and Computer Engineering, Texas Tech University, Lubbock, Texas 79409 (United States)

Description

The optical properties of catalyst-free AlN nanowires grown on Si substrates by molecular beam epitaxy were investigated. Such nanowires are nearly free of strain, with strong free exciton emission measured at room temperature. The photoluminescence intensity is significantly enhanced, compared to previously reported AlN epilayer. Moreover, the presence of phonon replicas with an energy separation of ∼100 meV was identified to be associated with the surface-optical phonon rather than the commonly reported longitudinal-optical phonon, which is further supported by the micro-Raman scattering experiments.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
104
Journal Issue
22
Journal Page Range
p. 223107-223107.4
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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