The study of structure and optical properties of Nanoparticles(NPs)-Cu/SiO2 multilayer films deposited alternately by magnetron sputtering technique
Description
NPs-Cu/SiO2 multilayer films were deposited alternately by magnetron sputtering on single silicon and Corning glass substrate with different Cu target power at room temperature (RT) and 400 °C. The structure of the NPs-Cu/SiO2 films was analyzed by X-ray diffraction (XRD) and transmission electron microscopy (TEM). The optical absorption property was investigated by Ultraviolet–visible spectroscopy (UV–Vis). The results of XRD and TEM indicate that Cu nanoparticles are basically spherical and disperse in the SiO2 matrix. The optical absorption peaks due to the surface plasmon resonance (SPR) of Cu nanoparticles are observed in the wavelength range of 590–650 nm. The SPR peak for NPs-Cu/SiO2 multilayer films shows the red-shift trend with increasing Cu target power, however, the SPR peak shows the blue-shift trend with increasing the substrate temperature and the number of Cu layers
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2015.01.166Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2015.01.166;
- PII
- S0925-8388(15)00264-9;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 634
- Journal Page Range
- p. 281-287
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47016807
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ABSORPTION; FILMS; GLASS; LAYERS; NANOPARTICLES; OPTICAL PROPERTIES; RED SHIFT; RESONANCE; SILICON OXIDES; SPECTROSCOPY; SURFACES; TEMPERATURE RANGE 0273-0400 K; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PARTICLES; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SILICON COMPOUNDS; SORPTION; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.