Published July 29, 2016
| Version v1
Journal article
Electrode-induced digital-to-analog resistive switching in TaOx-based RRAM devices
- 1. Institute of Microelectronics, Tsinghua University, Beijing 100084 (China)
Description
In RRAM devices, electrodes play a significant role during the switching process. In this paper, different top electrodes are used for TaOy/Ta2O5−x/AlOσ triple-oxide-layer devices. Top electrode-induced digital resistive switching to analog resistive switching was observed. For Pt top electrode (TE) devices, abrupt digital resistive switching behavior was observed, while Al TE devices showed gradual analog resistive switching behavior. Devices with various AlOσ thicknesses and sizes were fabricated and characterized to evaluate the reliability of the analog resistive switching. The physical mechanisms responsible for this electrode-induced resistive switching behavior were discussed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/27/30/305201Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 27
- Journal Issue
- 30
- Journal Page Range
- [6 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50037853
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ALUMINIUM OXIDES; ELECTRODES; LAYERS; MEMORY DEVICES; NANOSTRUCTURES; TANTALUM OXIDES; THICKNESS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; DIMENSIONS; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS