Published July 29, 2016 | Version v1
Journal article

Electrode-induced digital-to-analog resistive switching in TaOx-based RRAM devices

  • 1. Institute of Microelectronics, Tsinghua University, Beijing 100084 (China)

Description

In RRAM devices, electrodes play a significant role during the switching process. In this paper, different top electrodes are used for TaOy/Ta2O5−x/AlOσ triple-oxide-layer devices. Top electrode-induced digital resistive switching to analog resistive switching was observed. For Pt top electrode (TE) devices, abrupt digital resistive switching behavior was observed, while Al TE devices showed gradual analog resistive switching behavior. Devices with various AlOσ thicknesses and sizes were fabricated and characterized to evaluate the reliability of the analog resistive switching. The physical mechanisms responsible for this electrode-induced resistive switching behavior were discussed. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/27/30/305201

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
27
Journal Issue
30
Journal Page Range
[6 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50037853
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ALUMINIUM OXIDES; ELECTRODES; LAYERS; MEMORY DEVICES; NANOSTRUCTURES; TANTALUM OXIDES; THICKNESS
Descriptors DEC
ALUMINIUM COMPOUNDS; CHALCOGENIDES; DIMENSIONS; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS