Published August 1998 | Version v1
Journal article

Study of residual products of glycine implanted with low energy nitrogen ions

  • 1. Academia Sinica, Hefei (China). Inst. of Plasma Physics

Description

Solid state glycine (Gly) films were implanted with 20 keV N+ ions. Then the induced damages were studied by the measurements of electric conductivity, amino content in aqueous solution and α-particle transmission spectra. It is shown that the amount of damage products increases with increasing implantation dose and then decreases after reaching a peak. The XPS data revealed that several damage products were formed in which C and N elements have different binding energies than those in unimplanted glycine

Additional details

Publishing Information

Journal Title
Nuclear Techniques
Journal Volume
21
Journal Issue
8
Journal Page Range
p. 465-469
ISSN
0253-3219