Published March 2009
| Version v1
Journal article
Modelling of Hot-Electron Energy in Short-Channel MOSFETs by Electrical Method
Creators
- 1. National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan 030051 (China)
Description
Channel hot-electron (HE) energy in short-channel metal–oxide–semiconductor field-effect transistors (MOSFETs) is estimated based on electrical characterization. The HE assisted gate leakage is monitored, and its energy dependent tunnelling probability is calculated, from which the excess energy of HE is estimated. The credibility of the proposed method is supported by the experimental and theoretical results, and its accuracy in ultra-small-feature-size device application is also discussed. (condensed matter: electronicstructure, electrical, magnetic, and opticalproperties)
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/26/3/037104Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 26
- Journal Issue
- 3
- Journal Page Range
- [3 p.]
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44124187
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ACCURACY; CALCULATION METHODS; ELECTRIC CURRENTS; ELECTRONS; ENERGY DEPENDENCE; HETEROJUNCTIONS; INTERFACES; MOSFET; PROBABILITY; TUNNEL EFFECT
- Descriptors DEC
- CURRENTS; ELEMENTARY PARTICLES; FERMIONS; FIELD EFFECT TRANSISTORS; LEPTONS; MOS TRANSISTORS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS; TRANSISTORS