Published August 1993 | Version v1
Journal article

Deposition of titanium-based films by laser-assisted thermal CVD of titanium tetrachloride

  • 1. Laser Dept., Inst. of Atomic Physics, Bucharest (Romania)
  • 2. Inst. for Nuclear Research, Pitesti (Romania)

Description

The results of a study of laser-assisted CVD of thin titanium films from TiCl4 using a CO2 laser are presented. The Ti-based layers deposited onto quartz substrates were investigated by XPS technics. The influence of the incident laser energy on the chemical content of films as well as on the film growth rate was pointed out. The experimental results indicate that, on quartz substrate a multilayer structure is formed with unsaturated TiSix at the interface and oxidized phases at the surface. (orig.)

Additional details

Publishing Information

Journal Title
Journal de Physique 4. Colloque
Journal Volume
3
Journal Issue
3
Journal Page Range
p. 265-272.
ISSN
1155-4339
CODEN
JPICEI

Conference

Title
9. international conference on chemical vapour deposition (Euro CVD-9).
Dates
22-27 Aug 1993.
Place
Tampere (Finland).