Published January 15, 2007
| Version v1
Journal article
Low-temperature CO gas sensors based on Au/SnO2 thick film
Creators
- 1. Department of Chemistry, Nankai University, Tianjin 300071 (China)
Description
A study on the low-temperature CO gas sensors based on Au/SnO2 thick film was reported. Au/SnO2 powders were prepared by a deposition-precipitation method. Thick films were fabricated from Au/SnO2 powders. X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and X-ray photoelectron spectroscopy (XPS) analyses were carried out for investigation of morphology and crystalline structure. Au/SnO2 thick film sensors exhibited high sensitivity to CO gas at relatively low operating temperature (83-210 deg. C). We also reported the effect of the calcination temperature of Au/SnO2 on the CO gas sensing behavior. The optimal calcination temperature of Au/SnO2 was 300 deg. C
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2006.06.052;
- PII
- S0169-4332(06)00911-1;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 253
- Journal Issue
- 6
- Journal Page Range
- p. 3057-3061
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39003270
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CALCINATION; CARBON OXIDES; FILMS; GOLD; POWDERS; PRECIPITATION; SENSITIVITY; TEMPERATURE RANGE 0273-0400 K; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CARBON COMPOUNDS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PYROLYSIS; SCATTERING; SEPARATION PROCESSES; SPECTROSCOPY; TEMPERATURE RANGE; THERMOCHEMICAL PROCESSES; TIN COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.