Published September 2003 | Version v1
Journal article

Study on the control performance of the negative high-voltage pulse power supply system for ECRH

  • 1. Hefei Univ. of Technology, Hefei (China). Energy Research Institute
  • 2. Chinese Academy of Sciences, Hefei (China). Inst. of Plasma Physics

Description

High-voltage power supply is one of the most important components in an ECRH system. Reliability and stability of high-voltage power distribution affect directly the running of the ECRH system. A mathematical model of the links of the power system is proposed in this paper. A PI adjuster with forward feed-in has been designed. According to the MATLAB simulation, the parameter of the adjuster is fixed. Experimental results show that good controllable performance of the power supply has been obtained

Additional details

Publishing Information

Journal Title
Nuclear Fusion and Plasma Physics
Journal Volume
23
Journal Issue
3
Journal Page Range
p. 181-185
ISSN
0254-6086

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
35089723
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CONTROL SYSTEMS; ECR HEATING; MATHEMATICAL MODELS; MITIGATION; POWER SUPPLIES; RELIABILITY; SIMULATION; STABILITY
Descriptors DEC
ELECTRONIC EQUIPMENT; EQUIPMENT; HEATING; HIGH-FREQUENCY HEATING; PLASMA HEATING